Published December 23, 2019
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EFFECTS OF BIAS VOLTAGES ON ADHESION AND PROPERTIES OF CHROMIUM NITRIDE THIN FILMS
- 1. Hanoi University of Science and Technology
- 2. Materials Science & Engineering
Description
Thin films were deposited on SUS440 stainless steel samples by arc plasma evaporation at substrate bias voltages of 10–100 V. X-ray diffraction, optical microscopy, field emission scanning electron microscopy, energy dispersive spectroscopy, microhardness test, and electrochemical test were used to investigate the morphology and properties of the thin films. Particularly, the thin films were composed of chromium nitride (CrN, phases of CrN + Cr) and 0.76 mm thick. They were deposited with microdroplets on the samples. The surface hardness of these films reached the highest value of 1492 HV at the bias of 20 V. As the bias voltage increased, the adhesion of the CrN thin films decreased. The excessively high bias voltage of 100 V led to the delamination of the CrN thin films. The electrochemical test demonstrated that the corrosion resistance in the 3% NaCl solution of CrN coating can be improved.
Translated Descriptions
⚠️
This is an automatic machine translation with an accuracy of 90-95%
Translated Description (Arabic)
تم ترسيب الأغشية الرقيقة على عينات من الفولاذ المقاوم للصدأ SUS440 عن طريق تبخر بلازما القوس عند جهد انحياز الركيزة 10–100 فولت. تم استخدام حيود الأشعة السينية، والمجهر البصري، والمجهر الإلكتروني لمسح الانبعاثات الميدانية، والمطياف المشتت للطاقة، واختبار الصلابة الدقيقة، والاختبار الكهروكيميائي للتحقيق في مورفولوجيا وخصائص الأغشية الرقيقة. على وجه الخصوص، كانت الأغشية الرقيقة تتكون من نتريد الكروم (CrN، أطوار CrN + Cr) وسمك 0.76 مم. تم ترسيبها مع قطرات دقيقة على العينات. وصلت صلابة سطح هذه الأغشية إلى أعلى قيمة 1492 HV عند انحياز 20 V. ومع زيادة جهد الانحياز، انخفض التصاق الأغشية الرقيقة CRN. أدى جهد الانحياز العالي بشكل مفرط البالغ 100 فولت إلى تفكيك الأغشية الرقيقة CRN. أظهر الاختبار الكهروكيميائي أنه يمكن تحسين مقاومة التآكل في محلول كلوريد الصوديوم بنسبة 3 ٪ لطلاء CrN.Translated Description (English)
Thin films were deposited on SUS440 stainless steel samples by arc plasma evaporation at substrate bias voltages of 10–100 V. X-ray diffraction, optical microscopy, field emission scanning electron microscopy, energy dispersive spectroscopy, microhardness test, and electrochemical test were used to investigate the morphology and properties of the thin films. Particularly, the thin films were composed of chromium nitride (CrN, phases of CrN + Cr) and 0.76 mm thick. They were deposited with microdroplets on the samples. The surface hardness of these films reached the highest value of 1492 HV at the bias of 20 V. As the bias voltage increased, the adhesion of the CrN thin films decreased. The excessively high bias voltage of 100 V led to the delamination of the CrN thin films. The electrochemical test demonstrated that the corrosion resistance in the 3% NaCl solution of CrN coating can be improved.Translated Description (French)
Thin films were deposited on SUS440 stainless steel samples by arc plasma evaporation at substrate bias voltages of 10–100 V. X-ray diffraction, optical microscopy, field emission scanning electron microscopy, energy dispersive spectroscopy, microhardness test, and electrochemical test were used to investigate the morphology and properties of the thin films. Particulièrement, les films fins ont été composés de nitrure de chrome (CrN, phases de CrN + Cr) et de 0,76 mm d'épaisseur. They were deposited with microdroplets on the samples. The surface hardness of these films reached the highest value of 1492 HV at the bias of 20 V. As the bias voltage increased, the adhesion of the CrN thin films decreased. The excessively high bias voltage of 100 V led to the delamination of the CrN thin films. Le test électrochimique a démontré que la résistance à la corrosion dans la solution à 3% de NaCl du revêtement CrN peut être améliorée.Translated Description (Spanish)
Thin films were deposited on SUS440 stainless steel samples by arc plasma evaporation at substrate bias voltages of 10–100 V. X-ray diffraction, optical microscopy, field emission scanning electron microscopy, energy dispersive spectroscopy, microhardness test, and electrochemical test were used to investigate the morphology and properties of the thin films. Particularly, the thin films were composed of chromium nitride (CrN, phases of CrN + Cr) and 0.76 mm thick. They were deposited with microdroplets on the samples. The surface hardness of these films reached the highest value of 1492 HV at the bias of 20 V. As the bias voltage increased, the adhesion of the CrN thin films decreased. The excessively high bias voltage of 100 V led to the delamination of the CrN thin films. The electrochemical test demonstrated that the corrosion resistance in the 3% NaCl solution of CrN coating can be improved.Files
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Additional details
Additional titles
- Translated title (Arabic)
- آثار الفولتية المتحيزة على التصاق وخصائص الأغشية الرقيقة لنتريد الكروم
- Translated title (English)
- EFFECTS OF BIAS VOLTAGES ON ADHESION AND PROPERTIES OF CHROMIUM NITRIDE THIN FILMS
- Translated title (French)
- EFFECTS OF BIAS VOLTAGES ON ADHESION AND PROPERTIES OF CHROMIUM NITRIDE THIN FILMS
- Translated title (Spanish)
- EFFECTS OF BIAS VOLTAGES ON ADHESION AND PROPERTIES OF CHROMIUM NITRIDE THIN FILMS
Identifiers
- Other
- https://openalex.org/W2996283842
- DOI
- 10.12776/ams.v25i4.1356